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Secondary Ion Mass Spectrometry SIMS III - Proceedings of the Third International Conference, Technical University, Budapest, Hungary, August 30-September 5, 1981 (Paperback, Softcover reprint of the original 1st ed. 1982)
A. Benninghoven, J. Giber, J. Laszlo, M. Riedel, H.W. Werner
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R2,977
Discovery Miles 29 770
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Ships in 10 - 15 working days
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Following the biannual meetings in MUnster (1977) and Stanford
(1979) the Third International Conference on Secondary Ion Mass
Spectroscopy was held in Budapest from August 31 to September 5,
1981. The Conference was attended by about 250 participants. The
success of the 1981 Conference in Budapest was especially due to
the excellent preparation and organization by the Local Organizing
Committee. We would also like to acknowledge the generous
hospitality and cooperation of the Hungarian Academy of Sciences.
Japan was chosen to be the location for the next conference in
1983. SIMS conferences are devoted to two main issues: improving
the application of SIMS in different and especially new fields, and
understanding the ion formation process. Needless to say, there is
a very strong interaction be tween these two issues. The major
reason for the rapid increase in SIMS activities in the last few
years is the fact that SIMS is a powerful tool for bulk, thin-film,
and surface analysis. Today it is extensively and successfully
applied in such different fields as depth profiling and imaging of
semiconductor devices, in isotope analysis of minerals, in imaging
biological tissues, in the study of catalysts and catalytic
reactions, in oxide-layer analysis on metals in drug detection, and
in the analysis of body fluids.
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