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The exploding market of information technology requires
ultrahigh-speed integrated circuits, which imposes formidable
challenges in terms of nanofabrication, advanced materials,
atomic-scale measurements and modeling. The enormous costs of
next-generation lithographic machines to mass produce integrated
circuits with sub-100nm resolution justify alternative approaches
where the use of advanced materials and techniques for
nanofabrication, including epitaxial growth and their powerful
modeling, can lead to more cost-effective strategies. This book
contains the proceedings of two symposia held at the 1999 MRS Fall
Meeting in Boston that address these issues - Advanced Materials
and Techniques for Nanolithography, and Atomic-Scale Measurements
and Atomistic Models of Epitaxial Growth and Lithography. The
reader will find an overview of the state of the art, both
theoretical and experimental in this technologically important
field. Topics include: advanced techniques for sub-100nm resolution
lithography and molecular electronics; epitaxial growth and
morphology; novel concepts of resists for nanolithography;
atomic-scale characterization and measurement; modeling and
atomistic simulations; and nanodevices and nanostructures.
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