Welcome to Loot.co.za!
Sign in / Register |Wishlists & Gift Vouchers |Help | Advanced search
|
Your cart is empty |
|||
Showing 1 - 1 of 1 matches in All Departments
As the feature size of microelectronic devices approaches the deep submicron regime, the process development and integration issues related to gate stack and silicide processing are key challenges. Gate leakage is rising due to direct tunneling. Power and reliability concerns are expected to limit the ultimate scaling of SiO2-based insulators to about 1.5nm. Gate insulators must not deleteriously affect the interface quality, thermal stability, charge trapping, or process integration. Metal gate materials and damascene gates are being investigated, in conjunction with the application of a high-permittivity gate insulator, to provide sufficient device performance at ULSI dimensions. The silicidation process is also coming under pressure. Narrow device widths and decreasing junction depths are making the formation of low-leakage, low-resistance silicide straps extremely difficult. Producing shallower junctions via ion implantation is inhibited by transient enhanced diffusion and low beam currents at low implantation energies. Gate stack and contact film effects, such as point defect injection, extended defect formation, and stress on ultrashallow junction formation must be considered.
|
You may like...
Aflatoxins in Food - A Recent…
Khalid Rehman Hakeem, Carlos A. F. Oliveira, …
Hardcover
R4,267
Discovery Miles 42 670
Advances in Trichoderma Biology for…
N. Amaresan, A. Sankaranarayanan, …
Hardcover
R4,745
Discovery Miles 47 450
Modern Tools and Techniques to…
Ajit Varma, Arun Kumar Sharma
Hardcover
R4,963
Discovery Miles 49 630
The Entolomataceae of Tasmania
machiel noordeloos, Genevieve M. Gates
Hardcover
R4,297
Discovery Miles 42 970
Sugar and Sugar Derivatives: Changing…
Narendra Mohan, Priyanka Singh
Hardcover
R4,269
Discovery Miles 42 690
Mycorrhizas - Functional Processes and…
Concepcion Azcon-Aguilar, Jose Miguel Barea, …
Hardcover
R4,976
Discovery Miles 49 760
|