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This book examines the European discussion about alternative
schooling in the 20th century. It refers to a stream of concepts
that are often described as New Education, Progressive Education,
Education Nouvelle or Reformpadagogik, and discusses a range of
different models of alternative schooling. Exploring the works of a
range of continental educational philosophers, including Lietz,
Blonsky, Kerschensteiner, Freinet, Decroly and Petersen, the book
offers a unique insight into texts not yet translated into English.
These educational models are presented with regards to the
biographical background of the authors; the crucial elements of
their construction; the historical interconnections between
schooling, society and culture; and finally their connection to
today's discussions in educational sciences. The book will be
highly relevant for researchers and advanced students working on
the theory, history and practice of schooling, particularly those
with a focus on alternative schooling and the philosophy of
education.
This book introduces six pedagogues from the German context to an
English-speaking audience, and demonstrates their significant
contribution to the field of alternative education. First and
foremost, the authors emphasise the importance of understanding the
history of education, to realise that in fact what we understand as
'normal' today is by no means the only course history could have
taken. The quest for alternative ways of schooling goes back to the
late eighteenth century, where educational thinkers advocated
various approaches in the face of rapid societal change. The chosen
six thinkers are not well known in the English-speaking scientific
community, and some are even infrequently cited in the German
context. In offering an historic and systematic introduction to
concepts that can frame Alternative Education in different ways,
this book allows the reader to critically reevaluate present forms
of education by using the past as a mirror.
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War and Education (Paperback)
Sebastian Engelmann, Bernhard Hemetsberger, Frank Jacob
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R3,359
R2,743
Discovery Miles 27 430
Save R616 (18%)
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Ships in 12 - 17 working days
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Plasma based transfer of photoresist (PR) patterns using 193nm PR
films usually suffer from high removal rates and excessive surface
and line edge roughness. The effects of process time, PR material,
bias and source power, pressure and gas chemistry were studied.
Polymer destruction in the top surface, oxygen and hydrogen loss
along with fluorination were observed for all materials initially,
which was followed by steady state etch conditions. A strong
dependence of plasma-induced surface chemical and morphological
changes on polymer structure was observed. In particular, the
adamantane group of 193 nm PR showed poor stability. Two linked
mechanisms for the roughening behavior of the films during
processing were identified: A physical pattern transfer mechanism
enhances initial roughness by nonuniform removal. Additional to
that, roughness formation occurred linear to the energy density
deposited during processing.Even for various feedgas chemistries
adamantyl containing polymers show enhanced roughening rates,
suggesting that the instability of the adamantyl structure used in
193nm PR polymers is the performance limiting factor for processing
PR materials.
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