This book examines the European discussion about alternative schooling in the 20th century. It refers to a stream of concepts that are often described as New Education, Progressive Education, Education Nouvelle or Reformpadagogik, and discusses a range of different models of alternative schooling. Exploring the works of a range of continental educational philosophers, including Lietz, Blonsky, Kerschensteiner, Freinet, Decroly and Petersen, the book offers a unique insight into texts not yet translated into English. These educational models are presented with regards to the biographical background of the authors; the crucial elements of their construction; the historical interconnections between schooling, society and culture; and finally their connection to today's discussions in educational sciences. The book will be highly relevant for researchers and advanced students working on the theory, history and practice of schooling, particularly those with a focus on alternative schooling and the philosophy of education.

This book introduces six pedagogues from the German context to an English-speaking audience, and demonstrates their significant contribution to the field of alternative education. First and foremost, the authors emphasise the importance of understanding the history of education, to realise that in fact what we understand as 'normal' today is by no means the only course history could have taken. The quest for alternative ways of schooling goes back to the late eighteenth century, where educational thinkers advocated various approaches in the face of rapid societal change. The chosen six thinkers are not well known in the English-speaking scientific community, and some are even infrequently cited in the German context. In offering an historic and systematic introduction to concepts that can frame Alternative Education in different ways, this book allows the reader to critically reevaluate present forms of education by using the past as a mirror.

Plasma based transfer of photoresist (PR) patterns using 193nm PR films usually suffer from high removal rates and excessive surface and line edge roughness. The effects of process time, PR material, bias and source power, pressure and gas chemistry were studied. Polymer destruction in the top surface, oxygen and hydrogen loss along with fluorination were observed for all materials initially, which was followed by steady state etch conditions. A strong dependence of plasma-induced surface chemical and morphological changes on polymer structure was observed. In particular, the adamantane group of 193 nm PR showed poor stability. Two linked mechanisms for the roughening behavior of the films during processing were identified: A physical pattern transfer mechanism enhances initial roughness by nonuniform removal. Additional to that, roughness formation occurred linear to the energy density deposited during processing.Even for various feedgas chemistries adamantyl containing polymers show enhanced roughening rates, suggesting that the instability of the adamantyl structure used in 193nm PR polymers is the performance limiting factor for processing PR materials.