Breakthroughs in nanotechnology have been coming at a rapid pace over the past few years. This was fueled by significant worldwide investments by governments and industry. But if these promising young technologies cannot begin to show commercial viability soon, that funding is in danger of disappearing as investors lose their appetites and the economic and scientific promise of nanotechnology may not be realized. Scrutinizing the barriers to commercial scale-up of nanotechnologies, the Nanomanufacturing Handbook presents a broad survey of the research being done to bring nanotechnology out of the laboratory and into the factory. Current research into nanotechnology focuses on the underlying science, but as this forward-looking handbook points out, the immediate need is for research into scale-up, process robustness, and system integration issues. Taking that message to heart, this book collects cutting-edge research from top experts who examine such topics as surface-programmed assembly, fabrication and applications of single-walled carbon nanotubes (SWNTs) including nanoelectronics, manufacturing nanoelectrical contacts, room-temperature nanoimprint and nanocontact technologies, nanocontacts and switch reliability, defects and surface preparation, and other innovative, application-driven initiatives. In addition to these technical issues, the author provides a survey of the current state of nanomanufacturing in the United States-the first of its kind-and coverage also reaches into patenting nanotechnologies as well as regulatory and societal issues. With timely, authoritative coverage accompanied by numerous illustrations, the Nanomanufacturing Handbook clarifies the current challenges facing industrial-scale nanotechnologies and outlines advanced tools and strategies that will help overcome them.

In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue a breakthrough in lithography technology is now needed. This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. The background to developments in lithography technology, trends in ULSI technology and future prospects are reviewed, and the requirements that future lithography technology must meet are described. Several important lithography methods, such as deep UV lithography, X-ray lithography, electron-beam lithography, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are illustrated at the beginning of each chapter to help the reader understand the basis of the different approaches.

The exploding market of information technology requires ultrahigh-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic-scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication, including epitaxial growth and their powerful modeling, can lead to more cost-effective strategies. This book contains the proceedings of two symposia held at the 1999 MRS Fall Meeting in Boston that address these issues - Advanced Materials and Techniques for Nanolithography, and Atomic-Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography. The reader will find an overview of the state of the art, both theoretical and experimental in this technologically important field. Topics include: advanced techniques for sub-100nm resolution lithography and molecular electronics; epitaxial growth and morphology; novel concepts of resists for nanolithography; atomic-scale characterization and measurement; modeling and atomistic simulations; and nanodevices and nanostructures.