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CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback) Loot Price: R803
Discovery Miles 8 030
Repayment Terms: R75 pm x 12*
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CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback): Alexander A. Demkov,...

CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback)

Alexander A. Demkov, Bill Taylor, H. Rusty Harris, Jeffery W. Butterbaugh, Willy Rachmady

Series: MRS Proceedings

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Loot Price R803 Discovery Miles 8 030 | Repayment Terms: R75 pm x 12*

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To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

General

Imprint: Cambridge UniversityPress
Country of origin: United Kingdom
Series: MRS Proceedings
Release date: June 2014
First published: June 2014
Editors: Alexander A. Demkov • Bill Taylor • H. Rusty Harris • Jeffery W. Butterbaugh • Willy Rachmady
Dimensions: 229 x 152 x 10mm (L x W x T)
Format: Paperback - Trade
Pages: 194
ISBN-13: 978-1-107-40832-6
Categories: Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
Books > Professional & Technical > Mechanical engineering & materials > Production engineering > Reliability engineering
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LSN: 1-107-40832-6
Barcode: 9781107408326

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