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Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design

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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016) Loot Price: R1,964

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Repayment Terms: R184 pm x 12*

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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016): Bei Yu, David Z. Pan

Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016)

Bei Yu, David Z. Pan

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List price ~~R3,873~~ Loot Price R1,964 Discovery Miles 19 640 | Repayment Terms: R184 pm x 12* You Save R1,909 (49%)

Expected to ship within 12 - 17 working days

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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

General

Imprint:	Springer International Publishing AG
Country of origin:	Switzerland
Release date:	November 2015
First published:	2016
Authors:	Bei Yu • David Z. Pan
Dimensions:	235 x 155 x 11mm (L x W x T)
Format:	Hardcover - Cloth over boards
Pages:	164
Edition:	1st ed. 2016
ISBN-13:	978-3-319-20384-3
Categories:	Books > Computing & IT > Applications of computing > Computer modelling & simulation Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > General Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design > General Promotions
LSN:	3-319-20384-3
Barcode:	9783319203843