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Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design
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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016)
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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016)
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This book introduces readers to the most advanced research results
on Design for Manufacturability (DFM) with multiple patterning
lithography (MPL) and electron beam lithography (EBL). The authors
describe in detail a set of algorithms/methodologies to resolve
issues in modern design for manufacturability problems with
advanced lithography. Unlike books that discuss DFM from the
product level or physical manufacturing level, this book describes
DFM solutions from a circuit design level, such that most of the
critical problems can be formulated and solved through
combinatorial algorithms.
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