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Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design

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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016) Loot Price: R2,257

Discovery Miles 22 570

Repayment Terms: R212 pm x 12*

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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016): Bei Yu, David Z. Pan

Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016)

Bei Yu, David Z. Pan

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Loot Price R2,257 Discovery Miles 22 570 | Repayment Terms: R212 pm x 12*

Expected to ship within 10 - 15 working days

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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

General

Imprint:	Springer International Publishing AG
Country of origin:	Switzerland
Release date:	November 2015
First published:	2016
Authors:	Bei Yu • David Z. Pan
Dimensions:	235 x 155 x 11mm (L x W x T)
Format:	Hardcover - Cloth over boards
Pages:	164
Edition:	1st ed. 2016
ISBN-13:	978-3-319-20384-3
Categories:	Books > Computing & IT > Applications of computing > Computer modelling & simulation Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > General Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design > General Promotions
LSN:	3-319-20384-3
Barcode:	9783319203843