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Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016) Loot Price: R1,839
Discovery Miles 18 390
Repayment Terms: R172 pm x 12*
You Save: R1,730 (48%)
Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016): Bei Yu, David Z. Pan

Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016)

Bei Yu, David Z. Pan

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List price R3,569 Loot Price R1,839 Discovery Miles 18 390 | Repayment Terms: R172 pm x 12* You Save R1,730 (48%)

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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

General

Imprint: Springer International Publishing AG
Country of origin: Switzerland
Release date: November 2015
First published: 2016
Authors: Bei Yu • David Z. Pan
Dimensions: 235 x 155 x 11mm (L x W x T)
Format: Hardcover - Cloth over boards
Pages: 164
Edition: 1st ed. 2016
ISBN-13: 978-3-319-20384-3
Categories: Books > Computing & IT > Applications of computing > Computer modelling & simulation
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > General
Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design > General
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LSN: 3-319-20384-3
Barcode: 9783319203843

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