Microlithography is the main technical driving force behind one of
the most important phenomenon in the history of technology -
microelectronics and the incredible shrinking transistor. These
dramatic increases in electronic functionality per unit cost each
year for early five decades, have transformed society. The gating
piece of technology in this marvel of manufacturing progress has
always been the process of lithography - the photochemical printing
of circuit patterns onto semiconductor wafers.
This text attempts a difficult task - to capture the fundamental
principles of the incredibly fast-changing field of semiconductor
microlithography in such a sway that these principles may be
effectively applied to past, present and future microfabrication
technology generations. Its focus is on the underlying scientific
principles of optical lithography, rather than its practice. It
will serve equally well as a university textbook (each chapter has
an extensive set of problems) and as an industry resource.
Much of the material contained in this book is, of course, a
tutorial review of the published literature on lithography and
related sciences, but a significant portion is new work, never
before having been published. there is no other single book that
covers the wide breadth of scientific disciplines needed in the
practice of optical microlithography. The major topics covered
within this text are optics (imaging and thin film interference
effects), photoresist chemistry (chemical reactions, diffusion, and
development phenomenon), lithography as a manufacturing process
(process control, critical dimension control, and overlay), and
resolution enhancement technologies.
General
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