This volume deals with the technologies of crystal fabrication, of
crystal machining, and of epilayer production and is the first book
on industrial and scientific aspects of crystal and layer
production. Highest-quality crystals and epitaxical layers form the
base for many of industries technological advances, including
telecommunication, computer and electric energy technology, and
those technologies based on lasers and nonlinear-optic crystals.
Furthermore, automobile electronics, audiovisual equipment and
infrared night-vision all depend on high-quality crystals and
epilayers, as do novel technologies currently in development and
planned for the future.
This book contains 29 contributions of leading crystal
technologists covering the following topics: General aspects of
crystal growth technology Silicon Compound semiconductors Oxides
and halides Crystal machining Epitaxy and layer deposition
Scientific and technological problems of production and
machining of industrial crystals are discussed by top experts, most
of the m from the major growth industries and crystal growth
centres.
It is anticipated that this volume will serve all scientists
and engineers involved in crystal and epilayer fabrication. In
addition, it will be useful for the users of crystals, for teachers
and graduate students in materials sciences, in electronic and
other functional materials, chemical and metallurgical engineering,
micro-and optoelectronics including nanotechnology, mechanical
engineering and precision-machining, microtechnology, and in
solid-state sciences. Also consultants and specialists will profit
from this book, as will those interested in crystals, epilayers,
and their productionfor saving energy (GaN- and SiC-based
high-power electronics and light-emitting diodes for illumination)
and for renewable energy sources (economic high-efficiency solar
cells and forthcoming laser-fusion energy).
General
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