Handbook of Chemical Vapor Deposition - Principles, Technology and Applications (Hardcover, New)

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

General

Imprint:	William Andrew Publishing
Country of origin:	United States
Release date:	1999
First published:	1999
Authors:	Hugh O. Pierson
Dimensions:	229 x 152 x 25mm (L x W x T)
Format:	Hardcover
Pages:	458
Edition:	New
ISBN-13:	978-0-8155-1300-1
Categories:	Books > Professional & Technical > Mechanical engineering & materials > Engineering skills & trades > General Promotions
LSN:	0-8155-1300-3
Barcode:	9780815513001

Is the information for this product incomplete, wrong or inappropriate? Let us know about it.

Does this product have an incorrect or missing image? Send us a new image.

Is this product missing categories? Add more categories.

Review This Product

No reviews yet - be the first to create one!