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Theory and Application of Laser Chemical Vapor Deposition (Paperback, Softcover reprint of the original 1st ed. 1995) Loot Price: R4,602

Discovery Miles 46 020

Repayment Terms: R431 pm x 12*

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Theory and Application of Laser Chemical Vapor Deposition (Paperback, Softcover reprint of the original 1st ed. 1995): J....

Theory and Application of Laser Chemical Vapor Deposition (Paperback, Softcover reprint of the original 1st ed. 1995)

J. Mazumder, Aravinda Kar

Series: Lasers, Photonics, and Electro-Optics

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Loot Price R4,602 Discovery Miles 46 020 | Repayment Terms: R431 pm x 12*

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In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

General

Imprint:	Springer-Verlag New York
Country of origin:	United States
Series:	Lasers, Photonics, and Electro-Optics
Release date:	June 2013
First published:	1995
Authors:	J. Mazumder • Aravinda Kar
Dimensions:	229 x 152 x 21mm (L x W x T)
Format:	Paperback
Pages:	396
Edition:	Softcover reprint of the original 1st ed. 1995
ISBN-13:	978-1-4899-1432-3
Categories:	Books > Professional & Technical > Energy technology & engineering > Electrical engineering > General Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General Promotions
LSN:	1-4899-1432-3
Barcode:	9781489914323