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Theory and Application of Laser Chemical Vapor Deposition (Paperback, Softcover reprint of the original 1st ed. 1995) Loot Price: R4,256
Discovery Miles 42 560
Repayment Terms: R399 pm x 12*
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Theory and Application of Laser Chemical Vapor Deposition (Paperback, Softcover reprint of the original 1st ed. 1995): J....

Theory and Application of Laser Chemical Vapor Deposition (Paperback, Softcover reprint of the original 1st ed. 1995)

J. Mazumder, Aravinda Kar

Series: Lasers, Photonics, and Electro-Optics

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Loot Price R4,256 Discovery Miles 42 560 | Repayment Terms: R399 pm x 12*

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In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

General

Imprint: Springer-Verlag New York
Country of origin: United States
Series: Lasers, Photonics, and Electro-Optics
Release date: June 2013
First published: 1995
Authors: J. Mazumder • Aravinda Kar
Dimensions: 229 x 152 x 21mm (L x W x T)
Format: Paperback
Pages: 396
Edition: Softcover reprint of the original 1st ed. 1995
ISBN-13: 978-1-4899-1432-3
Categories: Books > Professional & Technical > Energy technology & engineering > Electrical engineering > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General
LSN: 1-4899-1432-3
Barcode: 9781489914323

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