The present research work reports the parametric study of ion beams
emitted from two different Mather type plasma focus devices and
their utilization in materials processing. Experiments have been
conducted by using a conventional 2.3 kJ UNU/ICTP plasma focus
device and the NX2 device (a repetitive plasma focus). The ion
parameters such as energy, energy distribution, number density and
current density are evaluated in the ambient gas pressure by
employing a BPX65 photodiode and a Faraday cup (Fe using time of
flight technique. A major motivation is to establish the optimum
processing conditions for ion nitriding, surface modification,
phase changes and carburizing of materials of industrial interest
like Ti, AlFe1.8Zn0.8 alloy and SS-321 in plasma environment. The
processed samples are characterized for structural and
morphological changes, compositional profile and surface hardness
by employing XRD, SEM FESEM, EDX, XPS, Raman spectroscopy and
Vickers microhardness test. The SRIM code and microindentation
measurements are used to estimate the depth profile of the modified
layers.
General
Imprint: |
VDM Verlag
|
Country of origin: |
Germany |
Release date: |
July 2010 |
First published: |
July 2010 |
Authors: |
Muhammad Hassan
|
Dimensions: |
229 x 152 x 10mm (L x W x T) |
Format: |
Paperback - Trade
|
Pages: |
168 |
ISBN-13: |
978-3-639-27663-3 |
Categories: |
Books >
Science & Mathematics >
Physics >
General
|
LSN: |
3-639-27663-9 |
Barcode: |
9783639276633 |
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