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Surface Engineering - Surface Modification of Materials (Paperback, Softcover reprint of the original 1st ed. 1984)
Loot Price: R14,546
Discovery Miles 145 460
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Surface Engineering - Surface Modification of Materials (Paperback, Softcover reprint of the original 1st ed. 1984)
Series: NATO Science Series E:, 85
Expected to ship within 10 - 15 working days
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Over the last few years there has been increasing need for
systematic and straregically designed experiments of surface
morphology evolution resulting form ion bombardment induced
sputtering. Although there is an impressive number of investi
gations {1} concerned with semiconductor materials as a result of
immediate applications, the most systematic investigations have
been conducted with fcc metals with particular interest on single
crystal Cu {2,3}. Evidence now exists that within certain para
meters (i. e ion species (Ar+), ion energy (20-44 KeV), substrate 2
temperature (80-550 Degrees K), dose rate (100-500 gA cm- ) ,
residual x 5 9 pressure (5 10- to 5x10- mm Hg) and polar and
azimuthal angle of ion incidence {4} reproducible surface
morphology (etch pits and pyramids) is achieved on the (11 3 1)
specific crystallographic orientation. The temporal development of
individual surface features was alsoobserved in this laterstudy
{4}, by employing an in situ ion source in the scanning electron
microscope at Salford, a technique also empolyed in studies of the
influence of polar angle of ion incidence {5} and surface
contaminants {6} on the topographyof Ar+ bombarded Si. Studies have
also been made on the variation of incident ion species with the
(11 3 1) Cu surface and it was fully recognized {7} that residual
surface contaminants when present could playa major role in
dictating the morhological evolution.
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