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Industrial Applications Of Ultrafast Lasers (Hardcover)
Loot Price: R3,491
Discovery Miles 34 910
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Industrial Applications Of Ultrafast Lasers (Hardcover)
Series: Materials and Energy, 11
Expected to ship within 10 - 15 working days
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This book describes the application of ultrafast laser science and
technology in materials and processing relevant to industry today,
including ultrafast laser ablation where fundamental studies have
led to the development of the world's first femtosecond photomask
repair tool. Semiconductor manufacturing companies worldwide use
the tool to repair photomask defects, saving hundreds of millions
in production costs. The most up-to-date ultrafast laser
technologies are described and methods to generate high harmonics
for photoelectron spectroscopy of industrially important materials
are covered, with an emphasis on practical laboratory
implementation. Basic device physics merged with photoemission
studies from single- and polycrystalline materials are described.
Extensions to new methods for extracting key device properties of
metal-oxide-semiconductor structures, including band offsets,
effective work functions, semiconductor band bending and
defect-related charging in a number of technologically important
gate oxides are detailed. Polycrystalline photovoltaic materials
and heterostructures as well as organic light emitting materials
are covered. This book describes both the history, and most recent
applications of ultrafast laser science to industrially relevant
materials, processes and devices.
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