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High-Resolution X-Ray Scattering - From Thin Films to Lateral Nanostructures (Hardcover, 2nd ed. 2004)
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High-Resolution X-Ray Scattering - From Thin Films to Lateral Nanostructures (Hardcover, 2nd ed. 2004)
Series: Advanced Texts in Physics
Expected to ship within 12 - 17 working days
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Total price: R2,351
Discovery Miles: 23 510
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During the last 20 years interest in high-resolution x-ray
diffractometry and reflectivity has grown as a result of the
development of the semiconductor industry and the increasing
interest in material research of thin layers of magnetic, organic,
and other materials. For example, optoelectronics requires a
subsequent epitaxy of thin layers of different semiconductor
materials. Here, the individuallayer thicknesses are scaled down to
a few atomic layers in order to exploit quantum effects. For
reasons of electronic and optical confinement, these thin layers
are embedded within much thicker cladding layers or stacks of
multilayers of slightly different chemical composition. It is
evident that the interface quality of those quantum weHs is quite
important for the function of devices. Thin metallic layers often
show magnetic properties which do not ap pear for thick layers or
in bulk material. The investigation of the mutual interaction of
magnetic and non-magnetic layers leads to the discovery of colossal
magnetoresistance, for example. This property is strongly related
to the thickness and interface roughness of covered layers."
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