High-Resolution X-Ray Scattering - From Thin Films to Lateral Nanostructures (Hardcover, 2nd ed. 2004)

During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers."

General

Imprint:	Springer-Verlag New York
Country of origin:	United States
Series:	Advanced Texts in Physics
Release date:	August 2004
First published:	2004
Authors:	Ullrich Pietsch • Vaclav Holy • Tilo Baumbach
Dimensions:	235 x 155 x 23mm (L x W x T)
Format:	Hardcover
Pages:	408
Edition:	2nd ed. 2004
ISBN-13:	978-0-387-40092-1
Categories:	Books > Science & Mathematics > Physics > States of matter > General Promotions
LSN:	0-387-40092-3
Barcode:	9780387400921

Is the information for this product incomplete, wrong or inappropriate? Let us know about it.

Does this product have an incorrect or missing image? Send us a new image.

Is this product missing categories? Add more categories.

Review This Product

No reviews yet - be the first to create one!