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Early in 1989, while most of us were gathered in the Mediterranean
five-centuries-old city of Alacant, the idea of a school on
stopping and particle penetration phenomena came to our minds.
Later that year when discussing this plan with some of the
participants in the 13th International Conference on Atomic
Collisions in Solids in Aarhus, we were pleased to note that the
proposal was warmly welcomed indeed by the community. An Advanced
Study Institute on this or a related subject had not been organized
in the last decade. Because of the progress made particularly in
the interaction of high energy beams with matter, and the many
applications which the general subject of the stopping of charged
particles (ions and electrons) in matter enjoys, a Study Institute
appeared a worthy enterprise. Even though several international
conference series cover developments in these areas, they miss
tutorial introductions to the field. The title chosen was
Interaction of Charged Particles with Solids and Surfaces, and the
objectives were stated as follows: "to cover theory and
experiments, including selected applications and hot topics, of the
stopping of charged particles (ions and electrons) in matter. The
emphasis will be on outlining the areas where further effort is
needed, and on specifying the basic needs in applications.
Fundamental concepts will prevail over applications, and the
character of the Institute as a school will be stressed. " The
school was directed by Fernando Flores (Spain), Herbert M. Urbassek
(Germany), Nestor R.
An understanding of the processes involved in the basic and applied
physics and chemistry of the interaction of plasmas with materials
is vital to the evolution of technologies such as those relevant to
microelectronics, fusion and space. The subjects dealt with in the
book include: the physics and chemistry of plasmas, plasma
diagnostics, physical sputtering and chemical etching, plasma
assisted deposition of thin films, ion and electron bombardment,
and plasma processing of inorganic and polymeric materials. The
book represents a concentration of a substantial amount of
knowledge acquired in this area - knowledge which was hitherto
widely scattered throughout the literature - and thus establishes a
baseline reference work for both established and tyro research
workers.
An understanding of the processes involved in the basic and applied
physics and chemistry of the interaction of plasmas with materials
is vital to the evolution of technologies such as those relevant to
microelectronics, fusion and space. The subjects dealt with in the
book include: the physics and chemistry of plasmas, plasma
diagnostics, physical sputtering and chemical etching, plasma
assisted deposition of thin films, ion and electron bombardment,
and plasma processing of inorganic and polymeric materials. The
book represents a concentration of a substantial amount of
knowledge acquired in this area - knowledge which was hitherto
widely scattered throughout the literature - and thus establishes a
baseline reference work for both established and tyro research
workers.
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