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A Synergistic Framework for Hardware IP Privacy and Integrity Protection (Hardcover, 1st ed. 2020): Meng Li, David Z. Pan A Synergistic Framework for Hardware IP Privacy and Integrity Protection (Hardcover, 1st ed. 2020)
Meng Li, David Z. Pan
R2,789 Discovery Miles 27 890 Ships in 10 - 15 working days

This book proposes a synergistic framework to help IP vendors to protect hardware IP privacy and integrity from design, optimization, and evaluation perspectives. The proposed framework consists of five interacting components that directly target at the primary IP violations. All the five algorithms are developed based on rigorous mathematical modeling for primary IP violations and focus on different stages of IC design, which can be combined to provide a formal security guarantee.

Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016): Bei Yu, David Z. Pan Design for Manufacturability with Advanced Lithography (Hardcover, 1st ed. 2016)
Bei Yu, David Z. Pan
R3,721 R1,798 Discovery Miles 17 980 Save R1,923 (52%) Ships in 12 - 17 working days

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

A Synergistic Framework for Hardware IP Privacy and Integrity Protection (Paperback, 1st ed. 2020): Meng Li, David Z. Pan A Synergistic Framework for Hardware IP Privacy and Integrity Protection (Paperback, 1st ed. 2020)
Meng Li, David Z. Pan
R2,765 Discovery Miles 27 650 Ships in 10 - 15 working days

This book proposes a synergistic framework to help IP vendors to protect hardware IP privacy and integrity from design, optimization, and evaluation perspectives. The proposed framework consists of five interacting components that directly target at the primary IP violations. All the five algorithms are developed based on rigorous mathematical modeling for primary IP violations and focus on different stages of IC design, which can be combined to provide a formal security guarantee.

Design for Manufacturability with Advanced Lithography (Paperback, Softcover reprint of the original 1st ed. 2016): Bei Yu,... Design for Manufacturability with Advanced Lithography (Paperback, Softcover reprint of the original 1st ed. 2016)
Bei Yu, David Z. Pan
R1,922 Discovery Miles 19 220 Ships in 10 - 15 working days

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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