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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. This second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallic-organic CVD (MOCVD) are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications. The new edition also chronicles the recent expansion of a number of materials produced by CVD, including copper, tungsten, diamond, silicon carbide and silicon nitride, titanium nitride, and others. Key Features: - Practical approach in the handbook stresses CVD use in industry, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters, and man others - Coverage of the chemistry and deposition techniques of new materials produced by CVD as been greatly expanded in the book - Special focus on the rapid growth of two major CVD processes: plasma CVD and metallo-organic CVD - Emphasizes the broad expansion of the use of CVD processes in today's industry, showing the reasons for the growth and the different appli-cations that have developed in the last few years
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
This book is a review of the science and technology of the element carbon and its allotropes: graphite, diamond and the fullerenes. This field has expanded greatly in the last three decades stimulated by many major discoveries such as carbon fibers, low-pressure diamond, and the fullerenes. The need for such a book has been felt for some time. These carbon materials are very different in structure and properties. Some are very old (charcoal), others brand new (the fullerenes). They have different applications and markets and are produced by different segments of the industry.Few studies are available that attempt to review the entire field of carbon as a whole discipline. Moreover these studies were written several decades ago and a generally outdated since the development of the technology is moving very rapidly and scope of applications is constantly expanding and reaching into new fields such as aerospace, automotive, semiconductors, optics, and electronics. In this book the author provides a valuable, up-to-date account of both the newer and traditional forms of carbon, both naturally occurring and man-made. This volume will be a valuable resource for both specialists in, and occasional users of carbon materials.
Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and opto-electronics. Some typical applications are as follows: 1. Silicon-nitride rotors, blades, rings, and burner tiles for gas turbines; 2) Tungsten-carbide cutting tools; 3) Titanium-nitride coatings on high-speed steel drill bits; 4) Silicon-carbide fibers and whiskers; 5) Boron-carbide abrasive blast nozzles; 6) Aluminum-nitride high thermal conductivity substrates for electronic circuits; 7) Silicon carbide burner tubes for gas furnaces; 8) Titanium nitride passivating and electrically insulating coatings for semiconductor devices; 9) Silicon carbide high-temperature semiconductor devices; 10) Silicon carbide blue light-emitting diode (LED). The refractory carbides and nitrides are reviewed together in one book because: 1. They form two families of closely related materials which have similar atomic structures and chemistry. 2. Carbon and nitrogen are next to each other the second period of the Table of the Elements and, in many cases, the carbides and nitrides form solid solutions (known as carbonitrides). 3. Manyof their properties are similar. 4. They have essentially the same processing characteristics and basically the same applications. 5. In many respects, they complement each other. The main objectives of this book can be summarized as follows: 1. Provide a complete review of the structures and properties of refractor carbides and nitrides 2. Provide a thorough assessment of the technology, processing, and equipment and systems used in production and R&D, with emphasis on advanced designs 3. Identify and describe the applications, particularly new and emerging areas.
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