Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of twenty volumes since 1963. The series contains quality studies of the properties of various thinfilms materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
Key Features
* Discusses the latest research about structure, physics, and infrared photoemissive behavior of heavily doped silicon homojunctions and Ge and GaAs-based alloy junctions
* Reviews the current status of SiGe/Si quantum wells for infrared detection
* Discusses key developments in the growing research on quantum-well infrared photodetectors (QWIPs)
* Reviews Chois development of a family of novel three-terminal, multi-quantum well devices designed to improve high-temperature IR detectivity at long wavelengths
* Describes recent studies aimed at using multi-quantum well structures to achieve higher performance in solar cell devices based on materials systems

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
Key Features
* Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed
* Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils
* Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology
* Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination.

The highly industrialized world we live in depends for its survival and further growth on advanced electronic technologies which place a premium on rapidly improved performance versus size, weight, and cost. Small computers, high-definition TV, digital camcorders, flat-panel displays, and robotic systems are but a few examples of miniatured device technologies which are of critical importance to emerging societal, industrial, defense, and space needs. All of these technologies depend sensitively on the availability of miniature thin film components in array and/or integrated formats. This book provides that first multi-topical coverage of the semiconductor, optical, superconductor, magnetic, and ferroelectric devices and technologies responding to these needs.
This book comprises five topical volumes edited by world authorities in their fields, i.e. semiconductor junction devices, semiconductor optics, superconducting film devices, magnetic film devices, and ferroelectric film devices. Well-known experts were invited to cover recent progress in aspects ranging from deposition and fabrication to device modeling, measurements, and new cutting-edge design approached for improved performance. This multitopic approach effectively demonstrates the broad-based and pervasive character of thin film techniques that impact and control a vast array of device functions that are critical to developments in computer technology, communications, television, defense and space systems, and industrial and consumer products. Readers are provided with both broad critical overviews and research level analysis and technical details.
Key Features
* A comprehensive discussion of the most promising andcompletely developed of thin film devices which impact the entire field of high-tech components and systems for commercial, defense and space applications
* Edited and written by internationally known, authoritative experts and innovators, familiar with all aspects of research and development in their fields and with current and potential applications
* Presents the reader with informed assessments of all candidate solid state film devices now being optimized for advanced application, e.g., in flat panel displays, solar energy conversion, high-speed and power components, radar technology, infrared imaging, advanced computers, laser sources, and numerous other arenas
* Provides a well-balanced coverage of materials growth and optimization, thin-film device modelling, device fabrication and characterization, and future development directions;These inputs are critically important to both educators, designers, device technologists and manufacturers, and to system engineers
* Furnishes useful insights on processing compatibility, materials and film device stability, interface engineering, cryogenic requirements and operation, lithography and micro-machining, and integrability for sub-systems
* Provides a broad-based view of alternative and/or complimentary film device technologies in a single, well-referenced source
* Ensures complete and detailed overview of solid-state device topics, comprehensive bibliographical information, and expert guidance in advanced and sophisticated areas of device technology and potental applications
* Furnishes invaluable insights on competitive state-of-the-art thin film semiconductor, photonics, superconductor, magnetic and ferroelectrictechnologies, processing and compatibility, device options, performance potential and prospects for essentially all solid-state film components
* An essential information source and primer for educators, researchers, engineers and technology leaders supplying a wealth of background theoretical and experimental details, as well as guidance for further advanced research and development, thesis topics and high-tech product design
* Identifies key processing, fabrication, design, integration, compatibility problems and solutions involved in successful development of high-performance and stable device and sub-system architectures