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Books > Science & Mathematics > Physics > States of matter > Plasma physics
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Plasma Sources for Thin Film Deposition and Etching, Volume 18 (Hardcover)
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Plasma Sources for Thin Film Deposition and Etching, Volume 18 (Hardcover)
Series: Physics of Thin Films
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This latest volume of the well-known Physics of Thin Films Series
includes four chapters that discuss high-density plasma sources for
materials processing, electron cyclotron resonance and its uses,
unbalancedmagnetron sputtering, and particle formation in thin film
processing plasma.
Key Features
* Chapter One develops a unified framework from which all
"high-efficiency" sources may be viewed and compared; outlines key
elements of source design affecting processing results; and
highlights areas where additional research and development are
needed
* Chapter Two reviews and analyzes the main types of electron
cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of
thin films, mainly ECR sources using magnet coils
* Chapter Three examines the benefits and limitations of the new
technique, unbalanced magnetron sputtering (UBM), along with the
motivation for its development, the basic principles of its
operation and commercial applications, and some speculations
regarding the future of UBM technology
* Chapter Four describes general phenomena observed in connection
with particle formation in thin film processing plasmas; discusses
particles in PECVD plasmas, sputtering plasmas, and RIE plasmas;
presents an overview of the theoretical modeling of various aspects
of particles in processing plasmas; examines issues of equipment
design affecting particle formation; and concludes with remarks
about the implications of this work for the control of
process-induced particle contamination.
General
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