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The synthesis of multicomponent/multilayered superconducting,
conducting, semiconducting and insulating thin films has become the
subject of an intensive, worldwide, interdisciplinary research
effort. The development of deposition-characterization techniques
and the science and technology related to the synthesis of these
films are critical for the successful evolution of this
interdisciplinary field of research and the implementation of the
new materials in a whole new generation of advanced microdevices.
This book contains the lectures and contributed papers on various
scientific and technological aspects of multicomponent and
multilayered thin films presented at a NATO/ASI. Compared to other
recent books on thin films, the distinctive character of this book
is the interdisciplinary treatment of the various fields of
research related to the different thin film materials mentioned
above. The wide range of topics discussed in this book include
vacuum-deposition techniques, synthesis-processing,
characterization, and devices of multicomponent/multilayered oxide
high temperature superconducting, ferroelectric, electro-optic,
optical, metallic, silicide, and compound semiconductor thin films.
The book presents an unusual intedisciplinary exchange of ideas
between researchers with cross-disciplinary backgrounds and it will
be useful to established investigators as well as postdoctoral and
graduate students.
An understanding of the processes involved in the basic and applied
physics and chemistry of the interaction of plasmas with materials
is vital to the evolution of technologies such as those relevant to
microelectronics, fusion and space. The subjects dealt with in the
book include: the physics and chemistry of plasmas, plasma
diagnostics, physical sputtering and chemical etching, plasma
assisted deposition of thin films, ion and electron bombardment,
and plasma processing of inorganic and polymeric materials. The
book represents a concentration of a substantial amount of
knowledge acquired in this area - knowledge which was hitherto
widely scattered throughout the literature - and thus establishes a
baseline reference work for both established and tyro research
workers.
The basic and applied science of electroceramic thin films
constitute one of the fast interdisciplinary evolving fields of
research worldwide. A major driving force for the extensive
research being performed in many Universities and Industrial and
National Laboratories is the promise of applications of
electroceramic thin ftlms into a whole new generation of advanced
microdevices that may revolutionize various technologies and create
new multibillion dollar markets. Properties of electroceramic thin
films that are being intensively investigated include electrical
conductivity, ferroelectricity, piezoelectricity, pyroelectricity,
electro-optic activity, and magnetism. Perhaps the most publicized
application of electroceramics is that related to the new high
temperature superconducting (HTSC) materials, which has been
extensively discussed in numerous national and international
conferences, including NATO/ASI's and ARW's. Less glamorously
publicized applications, but as important as those of HTSC
materials, are those involving the other properties mentioned
above, which were the subject of this ARW. Investigation on
ferroelectric thin films has experienced a tremendous development
in recent years due to the advent of sophisticated film synthesis
techniques and a substantial improvement in the understanding of
the related materials science and implementation of films in
various novel devices. A major driving force behind the progress in
this interdisciplinary field of research is the promise of the
development of a new generation of non-volatile memories with long
endurance and fast access time that can overcome the problems
encountered in the semiconductor non-volatile memory of
ferroelectric materials as high technology.
The basic and applied science of electroceramic thin films
constitute one of the fast interdisciplinary evolving fields of
research worldwide. A major driving force for the extensive
research being performed in many Universities and Industrial and
National Laboratories is the promise of applications of
electroceramic thin ftlms into a whole new generation of advanced
microdevices that may revolutionize various technologies and create
new multibillion dollar markets. Properties of electroceramic thin
films that are being intensively investigated include electrical
conductivity, ferroelectricity, piezoelectricity, pyroelectricity,
electro-optic activity, and magnetism. Perhaps the most publicized
application of electroceramics is that related to the new high
temperature superconducting (HTSC) materials, which has been
extensively discussed in numerous national and international
conferences, including NATO/ASI's and ARW's. Less glamorously
publicized applications, but as important as those of HTSC
materials, are those involving the other properties mentioned
above, which were the subject of this ARW. Investigation on
ferroelectric thin films has experienced a tremendous development
in recent years due to the advent of sophisticated film synthesis
techniques and a substantial improvement in the understanding of
the related materials science and implementation of films in
various novel devices. A major driving force behind the progress in
this interdisciplinary field of research is the promise of the
development of a new generation of non-volatile memories with long
endurance and fast access time that can overcome the problems
encountered in the semiconductor non-volatile memory of
ferroelectric materials as high technology.
The synthesis of multicomponent/multilayered superconducting,
conducting, semiconducting and insulating thin films has become the
subject of an intensive, worldwide, interdisciplinary research
effort. The development of deposition-characterization techniques
and the science and technology related to the synthesis of these
films are critical for the successful evolution of this
interdisciplinary field of research and the implementation of the
new materials in a whole new generation of advanced microdevices.
This book contains the lectures and contributed papers on various
scientific and technological aspects of multicomponent and
multilayered thin films presented at a NATO/ASI. Compared to other
recent books on thin films, the distinctive character of this book
is the interdisciplinary treatment of the various fields of
research related to the different thin film materials mentioned
above. The wide range of topics discussed in this book include
vacuum-deposition techniques, synthesis-processing,
characterization, and devices of multicomponent/multilayered oxide
high temperature superconducting, ferroelectric, electro-optic,
optical, metallic, silicide, and compound semiconductor thin films.
The book presents an unusual intedisciplinary exchange of ideas
between researchers with cross-disciplinary backgrounds and it will
be useful to established investigators as well as postdoctoral and
graduate students.
An understanding of the processes involved in the basic and applied
physics and chemistry of the interaction of plasmas with materials
is vital to the evolution of technologies such as those relevant to
microelectronics, fusion and space. The subjects dealt with in the
book include: the physics and chemistry of plasmas, plasma
diagnostics, physical sputtering and chemical etching, plasma
assisted deposition of thin films, ion and electron bombardment,
and plasma processing of inorganic and polymeric materials. The
book represents a concentration of a substantial amount of
knowledge acquired in this area - knowledge which was hitherto
widely scattered throughout the literature - and thus establishes a
baseline reference work for both established and tyro research
workers.
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