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These proceedings contain the reviewed papers presented at the
Symposium J on "Ion Implantation into Semiconductors, Oxides and
Ceramics," which was held at the Spring Meeting of the European
Materials Research Society in Strasbourg, France, 16-19, June 1998.
The symposium attracted 110 contributions, with authors from 31
nations in 5 continents. It was thereby the largest in a series of
E-MRS ion beam symposia, documenting the importance of ion beam
techniques and research in this area.
The aim of this symposium was to provide a forum for the
discussion of new results in the implantation of materials from
three different classes: semiconductors, oxides and ceramics.
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