Ion Implantation into Semiconductors, Oxides and Ceramics, Volume 85 (Hardcover)

These proceedings contain the reviewed papers presented at the Symposium J on "Ion Implantation into Semiconductors, Oxides and Ceramics," which was held at the Spring Meeting of the European Materials Research Society in Strasbourg, France, 16-19, June 1998. The symposium attracted 110 contributions, with authors from 31 nations in 5 continents. It was thereby the largest in a series of E-MRS ion beam symposia, documenting the importance of ion beam techniques and research in this area.
The aim of this symposium was to provide a forum for the discussion of new results in the implantation of materials from three different classes: semiconductors, oxides and ceramics.

General

Imprint:	Elsevier Science Ltd
Country of origin:	United Kingdom
Series:	European Materials Research Society Symposia Proceedings
Release date:	March 1999
First published:	1999
Editors:	B.G. Svensson • H. A Atwater • J.K.N. Lindner • P.L.F. Hemment
Dimensions:	297 x 210 x 25mm (L x W x T)
Format:	Hardcover
Pages:	454
ISBN-13:	978-0-08-043613-5
Categories:	Books > Science & Mathematics > Physics > Applied physics & special topics > Chemical physics Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Industrial chemistry > Ceramics & glass technology Books > Professional & Technical > Mechanical engineering & materials > Materials science > General Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors
LSN:	0-08-043613-7
Barcode:	9780080436135

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