Silicon, the basic material for a multibillion-dollar industry, is
the most widely researched and applied semiconductor, and its
surfaces are the most thoroughly studied of all semiconductor
surfaces. Silicon Surfaces and Formation of Interfaces may be used
as an introduction to graduate-level physics and chemical physics.
Moreover, it gives a specialized and comprehensive description of
the most common faces of silicon crystals as well as their
interaction with adsorbates and overlayers. This knowledge is
presented in a systematic and easy-to-follow way. Discussion of
each system is preceded by a brief overview which categorizes the
features and physical mechanisms before the details are presented.
The literature is easily available, and the references am numerous
and organized in tables, allowing a search without the need to
browse through the text.
Though this volume focuses on a scientific understanding of
physics on the atomistic and mesoscopic levels, it also highlights
existing and potential links between basic research in surface
science and applications in the silicon industry. It will be
valuable to anyone writing a paper, thesis, or proposal in the
field of silicon surfaces.
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