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Materials Fundamentals of Gate Dielectrics (Paperback, Softcover reprint of hardcover 1st ed. 2005)
Loot Price: R4,636
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Materials Fundamentals of Gate Dielectrics (Paperback, Softcover reprint of hardcover 1st ed. 2005)
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According to Bernie Meyerson, IBM's chief technology of?cer, the
traditional sc- ing of semiconductor manufacturing processes died
somewhere between the 1- and 90-nanometer nodes. One of the prime
reasons is the low dielectric constant of SiO - thechoice
dielectricof all modern electronics. This book presents materials 2
fundamentals of the novel gate dielectrics that are being
introduced into semic- ductor manufacturing to ensure the Moore's
law scaling of CMOS devices. This is a very rapidly evolving?eld of
research and we try to focus on the basicundersta- ing of
structure, thermodynamics, and electronic properties of these
materials that determine their performance in the device
applications. Thevolume was conceivedin 2001 afteraSymposium on
Alternative Gate - electrics we had at the American Physical
Society March Meeting in Seattle, upon the suggestion of the Kluwer
editor Sabine Freisem. After several discussions we decided that
such a bookindeed would be useful as long as we could focus on the
fundamental side of the problem and keep the level of the
discussion accessible to graduate students andavariety of
professionals from different ?elds. The problem of?nding a
replacement for SiO asa gate dielectric bringstogether inaunique
way 2 many fundamental disciplines. At the same time this problem
is truly applied and practical. It looked unlikelythat the perfect
new material would be foundfast; rather there would be a series of
evolving candidate materialsand approaches.
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