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Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials
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Oriented Crystallization on Amorphous Substrates (Hardcover, 1991 ed.)
Loot Price: R4,572
Discovery Miles 45 720
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Oriented Crystallization on Amorphous Substrates (Hardcover, 1991 ed.)
Series: Microdevices
Expected to ship within 10 - 15 working days
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Present-day scienceand technology have become increasingly based on
studies and applications of thin films. This is especiallytrue of
solid-state physics, semiconduc tor electronics, integrated optics,
computer science, and the like. In these fields, it is necessary to
use filmswith an ordered structure,
especiallysingle-crystallinefilms, because physical phenomena and
effects in such films are most reproducible. Also, active parts of
semiconductor and other devices and circuits are created, as a
rule, in single-crystal bodies. To date, single-crystallinefilms
have been mainly epitaxial (or heteroepitaxial); i.e., they have
been grown on a single-crystalline substrate, and principal trends,
e.g., in the evolution of integrated circuits (lCs), have been
based on continuing reduction in feature size and increase in the
number of components per chip. However, as the size decreases into
the submicrometer range, technological and physical limitations in
integrated electronics become more and more severe. It is generally
believed that a feature size of about 0.1um will have a crucial
character. In other words, the present two-dimensional ICs are
anticipated to reach their limit of minimization in the near
future, and it is realized that further increase of packing density
and/or functions might depend on three-dimensional integration. To
solve the problem, techniques for preparation of single-crystalline
films on arbitrary (including amorphous) substrates are essential."
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