Plasma processing of semiconductors is an interdisciplinary field
requiring knowledge of both plasma physics and chemical
engineering. The two authors are experts in each of these fields,
and their collaboration results in the merging of these fields with
a common terminology. Basic plasma concepts are introduced
painlessly to those who have studied undergraduate electromagnetics
but have had no previous exposure to plasmas. Unnecessarily
detailed derivations are omitted; yet the reader is led to
understand in some depth those concepts, such as the structure of
sheaths, that are important in the design and operation of plasma
processing reactors. Physicists not accustomed to low-temperature
plasmas are introduced to chemical kinetics, surface science, and
molecular spectroscopy. The material has been condensed to suit a
nine-week graduate course, but it is sufficient to bring the reader
up to date on current problems such as copper interconnects, low-k
and high-k dielectrics, and oxide damage. Students will appreciate
the web-style layout with ample color illustrations opposite the
text, with ample room for notes. The included CD contains a copy of
the book which can be indexed using a Search function, and which
can be enlarged on a monitor for a closer look at the diagrams.
Sample homework and exam problems can also be found on the CD.
This short book is ideal for new workers in the semiconductor
industry who want to be brought up to speed with minimum effort. It
is also suitable for Chemical Engineering students studying plasma
processing of materials; Engineers, physicists, and technicians
entering the semiconductor industry who want a quick overview of
the use of plasmas inthe industry.
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