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Molecular Beam Epitaxy - Fundamentals and Current Status (Paperback, Softcover reprint of the original 1st ed. 1989)
Loot Price: R1,550
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Molecular Beam Epitaxy - Fundamentals and Current Status (Paperback, Softcover reprint of the original 1st ed. 1989)
Series: Springer Series in Materials Science, 7
Expected to ship within 10 - 15 working days
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This first-ever monograph on molecular beam epitaxy (MBE) gives a
comprehensive presentation of recent developments in MBE, as
applied to crystallization of thin films and device structures of
different semiconductor materials. MBE is a high-vacuum technology
characterized by relatively low growth temperature, ability to
cease or initiate growth abruptly, smoothing of grown surfaces and
interfaces on an atomic scale, and the unique facility for in situ
analysis of the structural parameters of the growing film. The
excellent exploitation parameters of such MBE-produced devices as
quantum-well lasers, high electron mobility transistors, and
superlattice avalanche photodiodes have caused this technology to
be intensively developed. The main text of the book is divided into
three parts. The first presents and discusses the more important
problems concerning MBE equipment. The second discusses the
physico-chemical aspects of the crystallization processes of
different materials (mainly semiconductors) and device structures.
The third part describes the characterization methods which link
the physical properties of the grown film or structures with the
technological parameters of the crystallization procedure. Latest
achievements in the field are emphasized, such as solid source MBE,
including silicon MBE, gas source MBE, especially metalorganic MBE,
phase-locked epitaxy and atomic-layer epitaxy, photoassisted
molecular layer epitaxy and migration enhanced epitaxy.
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