This monograph represents a critical survey of the outstanding
capabilities of X-ray
diffuse scattering for the structural characterization of
mesoscopic material systems. The mesoscopic regime comprises length
scales ranging from a few up to some hundreds of nanometers. It is
of particular relevance at semiconductor layer systems where, for
example, interface roughness or low-dimensional objects such as
quantum dots and quantum wires have attracted much interest. An
extensive overview of the present state-of-the-art theory of X-ray
diffuse scattering at mesoscopic structures is given followed by a
valuable description of various experimental techniques. Selected
up-to-date examples are discussed. The aim of the present book is
to combine aspects of self-organized growth of mesoscopic
structures with corresponding X-ray diffuse scattering
experiments.
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