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Photoelasticity - Proceedings of the International Symposium on Photoelasticity, Tokyo, 1986 (Paperback, Softcover reprint of the original 1st ed. 1986)
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Photoelasticity - Proceedings of the International Symposium on Photoelasticity, Tokyo, 1986 (Paperback, Softcover reprint of the original 1st ed. 1986)
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Thirty-five papers were presented at the International Symposium on
Photoelasticity, Tokyo, 1986, representing fifty-five authors.
Eighteen of these papers were presented by Japanese
photoelasticians and seventeen by leading foreign authorities from
eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany,
France, Greece, India, Switzerland, UK, USA and USSR) * This is the
first symposium on photoelasticity of international scope held in
Japan. The primary objectives of this symposium are to help bridge
the gap between photoelastic researchers around the world, to
promote mutual understanding and communications and to facilitate
exchange of newly acquired knowledge in theories and techniques. In
addition, it is important that these valuable results are
communicated effectively to engineers who can apply them in
practice in industry. The papers presented at this symposium cover
all branches of photo elasticity in a broad sense, including, in
addition to long estab lished photoelasticity, newly developed
moire, interferometric, and holographic photoelasticity, caustics
and speckle. Therefore, from an optical stress analysis
pe~spective, this volume is the latest compre hensive collection of
photoelastic expertises.
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