To surmount the continuous scaling challenges of MOSFET devices,
FinFETs have emerged as the real alternative for use as the next
generation device for IC fabrication technology. The objective of
this book is to provide the basic theory and operating principles
of FinFET devices and technology, an overview of FinFET device
architecture and manufacturing processes, and detailed formulation
of FinFET electrostatic and dynamic device characteristics for IC
design and manufacturing. Thus, this book caters to practicing
engineers transitioning to FinFET technology and prepares the next
generation of device engineers and academic experts on mainstream
device technology at the nanometer-nodes.
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