"New Approaches to Image Processing Based Failure Analysis of
Nano-Scale ULSI Devices" introduces the reader to transmission and
scanning microscope image processing for metal and non-metallic
microstructures.
Engineers and scientists face the pressing problem in ULSI
development and quality assurance: microscopy methods can t keep
pace with the continuous shrinking of feature size in
microelectronics. Nanometer scale sizes are below the resolution of
light, and imaging these features is nearly impossible even with
electron microscopes, due to image noise.
This book presents novel "smart" image processing methods,
applications, and case studies concerning quality improvement of
microscope images of microelectronic chips and process
optimization. It explains an approach for high-resolution imaging
of advanced metallization for micro- and nanoelectronics. This
approach obviates the time-consuming preparation and selection of
microscope measurement and sample conditions, enabling not only
better electron-microscopic resolution, but also more efficient
testing and quality control. This in turn leads to productivity
gains in design and development of nano-scale ULSI chips.
The authors also present several approaches for super-resolving
low-resolution images to improve failure analysis of
microelectronic chips.
Acquaints users with new software-based approaches to enhance
high-resolution microscope imaging of microchip
structuresDemonstrates how these methods lead to productivity gains
in the development of ULSI chipsPresents several techniques for the
superresolution of images, enabling engineers and scientists to
improve their results in failure analysis of microelectronic
chips"
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