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An understanding of the processes involved in the basic and applied
physics and chemistry of the interaction of plasmas with materials
is vital to the evolution of technologies such as those relevant to
microelectronics, fusion and space. The subjects dealt with in the
book include: the physics and chemistry of plasmas, plasma
diagnostics, physical sputtering and chemical etching, plasma
assisted deposition of thin films, ion and electron bombardment,
and plasma processing of inorganic and polymeric materials. The
book represents a concentration of a substantial amount of
knowledge acquired in this area - knowledge which was hitherto
widely scattered throughout the literature - and thus establishes a
baseline reference work for both established and tyro research
workers.
An understanding of the processes involved in the basic and applied
physics and chemistry of the interaction of plasmas with materials
is vital to the evolution of technologies such as those relevant to
microelectronics, fusion and space. The subjects dealt with in the
book include: the physics and chemistry of plasmas, plasma
diagnostics, physical sputtering and chemical etching, plasma
assisted deposition of thin films, ion and electron bombardment,
and plasma processing of inorganic and polymeric materials. The
book represents a concentration of a substantial amount of
knowledge acquired in this area - knowledge which was hitherto
widely scattered throughout the literature - and thus establishes a
baseline reference work for both established and tyro research
workers.
Plasma etching plays an essential role in microelectronic circuit
manufacturing. Suitable for researchers, process engineers, and
graduate students, this book introduces the basic physics and
chemistry of electrical discharges and relates them to plasma
etching mechanisms. Throughout the volume the authors offer
practical examples of process chemistry, equipment design, and
production methods.
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