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Stochastic Process Variation in Deep-Submicron CMOS - Circuits and Algorithms (Hardcover, 2014 ed.)
Loot Price: R4,171
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Stochastic Process Variation in Deep-Submicron CMOS - Circuits and Algorithms (Hardcover, 2014 ed.)
Series: Springer Series in Advanced Microelectronics, 48
Expected to ship within 12 - 17 working days
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One of the most notable features of nanometer scale CMOS technology
is the increasing magnitude of variability of the key device
parameters affecting performance of integrated circuits. The growth
of variability can be attributed to multiple factors, including the
difficulty of manufacturing control, the emergence of new
systematic variation-generating mechanisms, and most importantly,
the increase in atomic-scale randomness, where device operation
must be described as a stochastic process. In addition to
wide-sense stationary stochastic device variability and temperature
variation, existence of non-stationary stochastic electrical noise
associated with fundamental processes in integrated-circuit devices
represents an elementary limit on the performance of electronic
circuits. In an attempt to address these issues, Stochastic Process
Variation in Deep-Submicron CMOS: Circuits and Algorithms offers
unique combination of mathematical treatment of random process
variation, electrical noise and temperature and necessary circuit
realizations for on-chip monitoring and performance calibration.
The associated problems are addressed at various abstraction
levels, i.e. circuit level, architecture level and system level. It
therefore provides a broad view on the various solutions that have
to be used and their possible combination in very effective
complementary techniques for both analog/mixed-signal and digital
circuits. The feasibility of the described algorithms and built-in
circuitry has been verified by measurements from the silicon
prototypes fabricated in standard 90 nm and 65 nm CMOS technology.
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