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Atomic Diffusion in III-V Semiconductors (Hardcover)
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Atomic Diffusion in III-V Semiconductors (Hardcover)
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III-V semiconductors, of which gallium arsenide is the best known,
have been important for some years and appear set to become much
more so in the future. They have principally contributed to two
technologies: microwave devices and optoelectronics. Recent
advances in the production of thin layers have made possible a
whole new range of devices based on multi-quantum wells. The heat
treatments used in the manufacture of semiconductor devices means
that some diffusion must take place. A good understanding of
diffusion processes is therefore essential to maintain control over
the technology.
Atomic Diffusion in III-V Semiconductors presents a lucid account
of the experimental work that has been carried out on diffusion in
III-Vs and explores the advanced models that explain the results. A
review of the III-V group of semiconductors outlines the special
properties that make them so attractive for some types of devices.
Discussion of the basic elements of diffusion in semiconductors
provides the theory necessary to understand the subject in depth,
and the book gives hints on how to assess the published data.
Chapters on diffusion of shallow donors, shallow acceptors,
transition elements, and very fast-diffusing elements provide a
critical review of published works. The book also presents the
neglected subject of self-diffusion, including a section on
superlattices. Atomic Diffusion in III-V Semiconductors will be of
interest to research workers in semiconductor science and
technology, and to postgraduate students in physics, electronics,
and materials science.
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