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Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)

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Ferroelectric-Gate Field Effect Transistor Memories - Device Physics and Applications (Paperback, 2nd ed. 2020) Loot Price: R4,391
Discovery Miles 43 910
Ferroelectric-Gate Field Effect Transistor Memories - Device Physics and Applications (Paperback, 2nd ed. 2020): Byung-Eun...

Ferroelectric-Gate Field Effect Transistor Memories - Device Physics and Applications (Paperback, 2nd ed. 2020)

Byung-Eun Park, Hiroshi Ishiwara, Masanori Okuyama, Shigeki Sakai, Sungmin Yoon

Series: Topics in Applied Physics, 131

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Loot Price R4,391 Discovery Miles 43 910 | Repayment Terms: R412 pm x 12*

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This book provides comprehensive coverage of the materials characteristics, process technologies, and device operations for memory field-effect transistors employing inorganic or organic ferroelectric thin films. This transistor-type ferroelectric memory has interesting fundamental device physics and potentially large industrial impact. Among various applications of ferroelectric thin films, the development of nonvolatile ferroelectric random access memory (FeRAM) has been most actively progressed since the late 1980s and reached modest mass production for specific application since 1995. There are two types of memory cells in ferroelectric nonvolatile memories. One is the capacitor-type FeRAM and the other is the field-effect transistor (FET)-type FeRAM. Although the FET-type FeRAM claims the ultimate scalability and nondestructive readout characteristics, the capacitor-type FeRAMs have been the main interest for the major semiconductor memory companies, because the ferroelectric FET has fatal handicaps of cross-talk for random accessibility and short retention time. This book aims to provide the readers with development history, technical issues, fabrication methodologies, and promising applications of FET-type ferroelectric memory devices, presenting a comprehensive review of past, present, and future technologies. The topics discussed will lead to further advances in large-area electronics implemented on glass, plastic or paper substrates as well as in conventional Si electronics. The book is composed of chapters written by leading researchers in ferroelectric materials and related device technologies, including oxide and organic ferroelectric thin films.

General

Imprint: Springer Verlag, Singapore
Country of origin: Singapore
Series: Topics in Applied Physics, 131
Release date: March 2021
First published: 2020
Editors: Byung-Eun Park • Hiroshi Ishiwara • Masanori Okuyama • Shigeki Sakai • Sungmin Yoon
Dimensions: 235 x 155mm (L x W)
Format: Paperback
Pages: 425
Edition: 2nd ed. 2020
ISBN-13: 978-981-15-1214-8
Categories: Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)
Books > Science & Mathematics > Chemistry > Physical chemistry > Surface chemistry & adsorption
Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General
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LSN: 981-15-1214-0
Barcode: 9789811512148

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