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Scanning Probe Lithography (Paperback, Softcover reprint of hardcover 1st ed. 2001) Loot Price: R2,924
Discovery Miles 29 240
Scanning Probe Lithography (Paperback, Softcover reprint of hardcover 1st ed. 2001): Hyongsok T. Soh, Kathryn Wilder Guarini,...

Scanning Probe Lithography (Paperback, Softcover reprint of hardcover 1st ed. 2001)

Hyongsok T. Soh, Kathryn Wilder Guarini, Calvin F Quate

Series: Microsystems, 7

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Loot Price R2,924 Discovery Miles 29 240 | Repayment Terms: R274 pm x 12*

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Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. SPL is capable of patterning sub-30nm features with nanometer-scale alignment registration. It is a relatively simple, inexpensive, reliable method for patterning nanometer-scale features on various substrates. It has potential applications for nanometer-scale research, for maskless semiconductor lithography, and for photomask patterning. The authors of this book have been key players in this exciting new field. Calvin Quate has been involved since the beginning in the early 1980s and leads the research time that is regarded as the foremost group in this field. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the members of this group who, in the last few years, have brought about remarkable series of advances in SPM lithography. Some of these advances have been in the control of the tip which has allowed the scanning speed to be increased from mum/second to mm/second. Both non-contact and in-contact writing have been demonstrated as has controlled writing of sub-100 nm lines over large steps on the substrate surface. The engineering of a custom-designed MOSFET built into each microcantilever for individual current control is another notable achievement. Micromachined arrays of probes each with individual control have been demonstrated. One of the most intriguing new aspects is the use of directly-grown carbon nanotubes as robust, high-resolution emitters. In this book the authors concisely and authoritatively describe the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this exciting new technology.

General

Imprint: Springer-Verlag New York
Country of origin: United States
Series: Microsystems, 7
Release date: December 2010
First published: 2001
Authors: Hyongsok T. Soh • Kathryn Wilder Guarini • Calvin F Quate
Dimensions: 235 x 155 x 12mm (L x W x T)
Format: Paperback
Pages: 197
Edition: Softcover reprint of hardcover 1st ed. 2001
ISBN-13: 978-1-4419-4894-6
Categories: Books > Professional & Technical > Mechanical engineering & materials > Production engineering > General
Books > Professional & Technical > Energy technology & engineering > Electrical engineering > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components
Books > Professional & Technical > Mechanical engineering & materials > Materials science > Testing of materials > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General
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LSN: 1-4419-4894-5
Barcode: 9781441948946

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