This volume describes the increasing role of "in situ" optical
diagnostics in thin film processing for applications ranging from
fundamental science studies to process development to control
during manufacturing. The key advantage of optical diagnostics in
these applications is that they are usually noninvasive and
nonintrusive. Optical probes of the surface, film, wafer, and gas
above the wafer are described for many processes, including plasma
etching, MBE, MOCVD, and rapid thermal processing. For each optical
technique, the underlying principles are presented, modes of
experimental implementation are described, and applications of the
diagnostic in thin film processing are analyzed, with examples
drawn from microelectronics and optoelectronics. Special attention
is paid to real-time probing of the surface, to the noninvasive
measurement of temperature, and to the use of optical probes for
process control.
Optical Diagnostics for Thin Film Processing is unique. No other
volume explores the real-time application of optical techniques in
all modes of thin film processing. The text can be used by students
and those new to the topic as an introduction and review of the
subject. It also serves as a comprehensive resource for engineers,
technicians, researchers, and scientists already working in the
field.
Key Features
* The only volume that comprehensively explores "in situ,"
real-time, optical probes for all types of thin film
processing
* Useful as an introduction to the subject or as a resource
handbook
* Covers a wide range of thin film processes including plasma
etching, MBE, MOCVD, and rapid thermal processing
* Examples emphasize applications in microelectronics and
optoelectronics
* Introductory chapter serves as a guide to all optical diagnostics
and their applications
* Each chapter presents the underlying principles, experimental
implementation, and applications for a specific optical diagnostic
General
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