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Computational Materials Chemistry - Methods and Applications (Paperback, 1st ed. Softcover of orig. ed. 2004)
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Computational Materials Chemistry - Methods and Applications (Paperback, 1st ed. Softcover of orig. ed. 2004)
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As a result of the advancements in algorithms and the huge increase
in speed of computers over the past decade, electronic structure
calculations have evolved into a valuable tool for characterizing
surface species and for elucidating the pathways for their
formation and reactivity. It is also now possible to calculate,
including electric field effects, STM images for surface
structures. To date the calculation of such images has been
dominated by density functional methods, primarily because the
computational cost of - curate wave-function based calculations
using either realistic cluster or slab models would be prohibitive.
DFT calculations have proven especially valuable for elucidating
chemical processes on silicon and other semiconductor surfaces.
However, it is also clear that some of the systems to which DFT
methods have been applied have large non-dynamical correlation
effects, which may not be properly handled by the current
generation of Kohn-Sham-based density functionals. For example, our
CASSCF calculations on the Si(001)/acetylene system reveal that at
some geometries there is extensive 86 configuration mixing. This,
in turn, could signal problems for DFT cal- lations on these
systems. Some of these problem systems can be addressed using ONIOM
or other "layering" methods, treating the primary region of
interest with a CASMP2 or other multireference-based method, and
treating the secondary region by a lower level of electronic
structure theory or by use of a molecular mechanics method.
ACKNOWLEDGEMENTS We wish to thank H. Jonsson, C. Sosa, D. Sorescu,
P. Nachtigall, and T. -C."
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