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Fundamental Electron Interactions with Plasma Processing Gases (Hardcover, 2004 ed.)
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Fundamental Electron Interactions with Plasma Processing Gases (Hardcover, 2004 ed.)
Series: Physics of Atoms and Molecules
Expected to ship within 10 - 15 working days
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This volume deals with the basic knowledge and understanding of
fundamental interactions of low energy electrons with molecules. It
pro vides an up-to-date and comprehensive account of the
fundamental in teractions of low-energy electrons with molecules of
current interest in modern technology, especially the semiconductor
industry. The primary electron-molecule interaction processes of
elastic and in elastic electron scattering, electron-impact
ionization, electron-impact dissociation, and electron attachment
are discussed, and state-of-the art authoritative data on the cross
sections of these processes as well as on rate and transport
coefficients are provided. This fundamental knowledge has been
obtained by us over the last eight years through a critical review
and comprehensive assessment of "all" available data on low-energy
electron collisions with plasma processing gases which we conducted
at the National Institute of Standards and Technology (NIST). Data
from this work were originally published in the Journal of Physical
and Chemical Reference Data, and have been updated and expanded
here. The fundamental electron-molecule interaction processes are
discussed in Chapter 1. The cross sections and rate coefficients
most often used to describe these interactions are defined in
Chapter 2, where some recent advances in the methods employed for
their measurement or calculation are outlined. The methodology we
adopted for the critical evaluation, synthesis, and assessment of
the existing data is described in Chapter 3. The critically
assessed data and recommended or suggested cross sections and rate
and transport coefficients for ten plasma etching gases are
presented and discussed in Chapters 4, 5, and 6."
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