Nanolithography - A Borderland between STM, EB, IB, and X-Ray Lithographies (Hardcover, 1994 ed.)

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

General

Imprint:	Springer
Country of origin:	Netherlands
Series:	NATO Science Series E:, 264
Release date:	April 1994
First published:	1994
Editors:	M. Gentili • Carlo Giovannella • Stefano Selci
Dimensions:	235 x 155 x 14mm (L x W x T)
Format:	Hardcover
Pages:	216
Edition:	1994 ed.
ISBN-13:	978-0-7923-2794-3
Categories:	Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)
LSN:	0-7923-2794-2
Barcode:	9780792327943

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