Nanolithography - A Borderland between STM, EB, IB, and X-Ray Lithographies (Paperback, Softcover reprint of hardcover 1st ed. 1994)

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

General

Imprint:	Springer
Country of origin:	Netherlands
Series:	NATO Science Series E:, 264
Release date:	December 2010
First published:	1994
Editors:	M. Gentili • Carlo Giovannella • Stefano Selci
Dimensions:	235 x 155 x 12mm (L x W x T)
Format:	Paperback
Pages:	216
Edition:	Softcover reprint of hardcover 1st ed. 1994
ISBN-13:	978-90-481-4388-7
Categories:	Books > Science & Mathematics > Physics > States of matter > General Books > Professional & Technical > Mechanical engineering & materials > Materials science > General Books > Professional & Technical > Energy technology & engineering > Electrical engineering > General Books > Science & Mathematics > Chemistry > Analytical chemistry > Qualitative analytical chemistry > Chemical spectroscopy, spectrochemistry > General
LSN:	90-481-4388-8
Barcode:	9789048143887

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