This book concentrates upon a form of scanning electron microscopy
in which electrons are focused onto the surface of a solid sample
and Auger electrons are emitted into an energy analyzer in which
their kinetic energy is established.
Following an introductory chapter setting the scene on the
topic, chapters 2 and 3 are concerned respectively with the theory
of the Auger process and the instrumentation needed in Auger
microscope. Chapters 4 and 5 discuss the limits to the spatial
resolution of the microscopy and the methods used to separate the
chemical information in an Auger image from potentially confusing
effects (referred to as "imaging artefacts") due to other
properties of the sample, the experimental geometry employed or the
methods used for collecting or displaying the data. Chapter 6
presents the software tools useful to interpret the information in
an Auger image. Chapter 7 discussed methods that can convert the
intensities of the pixels in a set of images using different Auger
peaks from the same area of a sample into a set of maps revealing
the atomic concentrations at each point in the surface - image
quantification. Chapters 8 and 9 describe some of the most
important applications of Auger microscopy in the fields of
metallurgy and of semiconductor device characterization.
The material in the book is intended as a guide to the subject
of Auger electron microscopy and so it is hoped that it will be of
interest to researchers in this field as well as to others who wish
to discover what can be achieved with this technique and what are
its limitations. In addition, it will be useful to analysts working
with SAMs who are hard pressed to measure many samples and
havelittle time to work on other aspects of the behaviour of their
instrument or the problems that they may, perhaps unwittingly
encounter.
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