Intended to update scientists and engineers on the current state
of the art in a variety of key techniques used extensively in the
fabrication of structures at the nanoscale. The present work covers
the essential technologies for creating sub 25 nm features
lithographically, depositing layers with nanometer control, and
etching patterns and structures at the nanoscale. A distinguishing
feature of this book is a focus not on extension of
microelectronics fabrication, but rather on techniques applicable
for building NEMS, biosensors, nanomaterials, photonic crystals,
and other novel devices and structures that will revolutionize
society in the coming years.
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