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Books > Science & Mathematics > Physics > Atomic & molecular physics

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Handbook of Advanced Plasma Processing Techniques (Paperback, Softcover reprint of the original 1st ed. 2000) Loot Price: R9,951
Discovery Miles 99 510
Handbook of Advanced Plasma Processing Techniques (Paperback, Softcover reprint of the original 1st ed. 2000): R. J Shul, S.J....

Handbook of Advanced Plasma Processing Techniques (Paperback, Softcover reprint of the original 1st ed. 2000)

R. J Shul, S.J. Pearton

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Loot Price R9,951 Discovery Miles 99 510 | Repayment Terms: R933 pm x 12*

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

General

Imprint: Springer-Verlag
Country of origin: Germany
Release date: November 2012
First published: 2000
Editors: R. J Shul • S.J. Pearton
Dimensions: 235 x 155 x 34mm (L x W x T)
Format: Paperback
Pages: 655
Edition: Softcover reprint of the original 1st ed. 2000
ISBN-13: 978-3-642-63096-5
Categories: Books > Science & Mathematics > Physics > Atomic & molecular physics
Books > Professional & Technical > Technology: general issues > Engineering: general
Books > Professional & Technical > Mechanical engineering & materials > Production engineering > General
Books > Professional & Technical > Mechanical engineering & materials > Materials science > Testing of materials > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General
LSN: 3-642-63096-0
Barcode: 9783642630965

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