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Directed Self-assembly of Block Co-polymers for Nano-manufacturing (Hardcover)
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Directed Self-assembly of Block Co-polymers for Nano-manufacturing (Hardcover)
Series: Woodhead Publishing Series in Electronic and Optical Materials
Expected to ship within 12 - 17 working days
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The directed self-assembly (DSA) method of patterning for
microelectronics uses polymer phase-separation to generate features
of less than 20nm, with the positions of self-assembling materials
externally guided into the desired pattern. Directed self-assembly
of Block Co-polymers for Nano-manufacturing reviews the design,
production, applications and future developments needed to
facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of
block copolymer (BCP) materials, Part 1 covers the synthesis of new
materials and new processing methods for DSA. Part 2 then goes on
to outline the key modelling and characterization principles of
DSA, reviewing templates and patterning using topographical and
chemically modified surfaces, line edge roughness and dimensional
control, x-ray scattering for characterization, and nanoscale
driven assembly. Finally, Part 3 discusses application areas and
related issues for DSA in nano-manufacturing, including for basic
logic circuit design, the inverse DSA problem, design decomposition
and the modelling and analysis of large scale, template
self-assembly manufacturing techniques.
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