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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Hardcover, 1st ed. 2018) Loot Price: R3,615
Discovery Miles 36 150
Repayment Terms: R339 pm x 12*
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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Hardcover, 1st ed. 2018): Seongbo Shim, Youngsoo Shin

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Hardcover, 1st ed. 2018)

Seongbo Shim, Youngsoo Shin

Series: NanoScience and Technology

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Loot Price R3,615 Discovery Miles 36 150 | Repayment Terms: R339 pm x 12*

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This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

General

Imprint: Springer International Publishing AG
Country of origin: Switzerland
Series: NanoScience and Technology
Release date: March 2018
First published: 2018
Authors: Seongbo Shim • Youngsoo Shin
Dimensions: 235 x 155mm (L x W)
Format: Hardcover
Pages: 138
Edition: 1st ed. 2018
ISBN-13: 978-3-319-76293-7
Categories: Books > Professional & Technical > Technology: general issues > Nanotechnology
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components
Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Other manufacturing technologies > Precision instruments manufacture > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors
LSN: 3-319-76293-1
Barcode: 9783319762937

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