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Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies (Hardcover, 2002 ed.) Loot Price: R2,706
Discovery Miles 27 060
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies (Hardcover, 2002 ed.): Y. Pauleau

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies (Hardcover, 2002 ed.)

Y. Pauleau

Series: NATO Science Series II: Mathematics, Physics and Chemistry, 55

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Loot Price R2,706 Discovery Miles 27 060 | Repayment Terms: R254 pm x 12*

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An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes.

A handbook for engineers and scientists and an introduction for students of microelectronics.

General

Imprint: Springer-Verlag New York
Country of origin: United States
Series: NATO Science Series II: Mathematics, Physics and Chemistry, 55
Release date: April 2002
First published: 2002
Editors: Y. Pauleau
Dimensions: 235 x 155 x 22mm (L x W x T)
Format: Hardcover
Pages: 363
Edition: 2002 ed.
ISBN-13: 978-1-4020-0524-4
Categories: Books > Science & Mathematics > Physics > States of matter > General
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LSN: 1-4020-0524-5
Barcode: 9781402005244

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