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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 (Hardcover, 1993 ed.)
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The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 (Hardcover, 1993 ed.)
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The first international symposium on the subject "The Physics and
Chemistry of Si02 and the Si-Si02 Interface," organized in
association with the Electrochemical Society, Inc. , was held in
Atlanta, Georgia on May 15- 20, 1988. This symposium contained
sixty papers and was so successful that the sponsoring divisions
decided to schedule it on a regular basis every four years. Thus,
the second symposium on "The Physics and Chemistry of Si02 and the
Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri,
again sponsored by the Electronics and Dielectrics Science and
Technology Divisions of The Electrochemical Society. This volume
contains manuscripts of most of the fifty nine papers presented at
the 1992 symposium, and is divided into eight chapters -
approximating the organization of the symposium. Each chapter is
preceded with an introduction by the session organizers. It is
appropriate to provide a general assessment of the current status
and understanding of the physics and chemistry of Si02 and the Si02
interface before proceeding with a brief overview of the individual
chapters. Semiconductor devices have continued to scale down in
both horizontal and vertical dimensions. This has resulted in
thinner gate and field oxides as well as much closer spacing of
individual device features. As a result, surface condition, native
oxide composition, and cleaning and impurity effects now provide a
much more significant contribution to the properties of oxides and
their interfaces.
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